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ACCESSIONPLANT NAMETAXONOMYORIGINGENEBANKIMAGEAVAILABILITYRECEIVEDSOURCE TYPESOURCE DATECOLLECTION SITECOORDINATESELEVATIONHABITATIMPROVEMENT LEVELNARRATIVE
0PI 679958'Benning-ME'Glycine max (L.) Merr. Georgia, United StatesSOYNot Available2017DEVELOPEDBreeding materialTwo soybean [Glycine max (L.) Merr] germplasm lines, Benning-ME and Benning-MGHE, were developed by the University of Georgia Agricultural Experiment Stations. Control of insect pests is crucial in soybean production; host-plant resistance reduces the need for insecticide applications, thus diminishing production costs and pesticide concerns. In soybean, resistance to a broad range of leaf-chewing insects is found in the Japanese plant introductions PI 229358 and PI 227687. In PI 229358, resistance is conferred by QTL-M, QTL-H, and QTL-G. In PI 227687, resistance is conferred by QTL-E. To enhance soybean resistance to leaf-chewing insects, PI 229358 and PI 227687’s QTLs were pyramided in Benning-EM and Benning-EMGH, which are near-isogenic lines of ‘Benning’, obtained through marker-assisted backcrossing. Under field conditions Benning-ME and Benning-MGHE sustain 67% and 57% less defoliation than Benning, respectively. To determine the QTL introgressions in each line, high-density SNP genotypes were obtained using the SoySNP50K iSelect BeadChips (Illumina, San Diego, USA). To facilitate selection of lines carrying a specific QTL pyramid, KASP markers were developed for high-throughput genotyping. These lines are valuable genetic resources for breeding of host-plant resistance to insects in soybean. The combination of QTL-M and QTL-E provides agriculturally relevant levels of resistance, and with only two loci, the use of this pyramid is feasible in a breeding program.1946638PI 679958
1PI 679959'Benning-MGHE'Glycine max (L.) Merr. Georgia, United StatesSOYNot Available2017DEVELOPEDBreeding materialTwo soybean [Glycine max (L.) Merr] germplasm lines, Benning-ME and Benning-MGHE, were developed by the University of Georgia Agricultural Experiment Stations. Control of insect pests is crucial in soybean production; host-plant resistance reduces the need for insecticide applications, thus diminishing production costs and pesticide concerns. In soybean, resistance to a broad range of leaf-chewing insects is found in the Japanese plant introductions PI 229358 and PI 227687. In PI 229358, resistance is conferred by QTL-M, QTL-H, and QTL-G. In PI 227687, resistance is conferred by QTL-E. To enhance soybean resistance to leaf-chewing insects, PI 229358 and PI 227687’s QTLs were pyramided in Benning-EM and Benning-EMGH, which are near-isogenic lines of ‘Benning’, obtained through marker-assisted backcrossing. Under field conditions Benning-ME and Benning-MGHE sustain 67% and 57% less defoliation than Benning, respectively. To determine the QTL introgressions in each line, high-density SNP genotypes were obtained using the SoySNP50K iSelect BeadChips (Illumina, San Diego, USA). To facilitate selection of lines carrying a specific QTL pyramid, KASP markers were developed for high-throughput genotyping. These lines are valuable genetic resources for breeding of host-plant resistance to insects in soybean. The combination of QTL-M and QTL-E provides agriculturally relevant levels of resistance, and with only two loci, the use of this pyramid is feasible in a breeding program.1946639PI 679959